Aluminum doping Nanostructured CuO Thin films to enhancement some physical properties

Abstract

CuO and CuO: Al thin films were precipitation on glass base at 400°C utilizing chemical spray pyrolysis (CSP) technique. XRD test disclosed that all films are polycrystalline with predominant peak at (111). AFM analysis displayed the surface topography of Undoped and Aluminum doped CuO thin films are nanostructure. Optical characterization shows all the films are highly transparent in visible area. A shift from E_g = 1.97 eV to 1.87 eV is seen when increasing doping in Al. The refractive index is affected via Aluminum content.